In the fabrication of optical waveguide devices, the uniformity and absolute thickness accuracy of the film thickness before etching are key factors determining the waveguide structure dimensions, etching depth control, and final optical performance. Optical waveguide pre-etching film thickness inspection equipment primarily addresses the quality inspection needs of waveguide layers, cladding, and related functional thin films before etching. It can perform high-precision measurement and analysis of film thickness, in-plane uniformity, local anomalies, edge thickness variations, and deposition defects, providing a reliable basis for subsequent etching process parameter setting and structural consistency control.
By implementing film thickness detection at key process nodes, risks such as etching deviation, mode mismatch, increased insertion loss, and decreased device consistency caused by film fluctuations can be effectively reduced, thereby improving product yield and end-product performance stability.